AJA International Sputter

Capabilities

  • Materials: Dielectrics (SiOx, SiNx, AlOx), semiconductors (Si), metal oxides (TCOs: ITO, IZO, AZO), non-conducting materials (B), etc.
  • Sample size: 6 in wafers, 4 in wafers, pieces.
  • Power: 3 RF sources
  • Number of gun: 4 guns
  • Heating: unavailable
  • Control: Software PhaseJ-II, Manual
Contact Email
marco.ernst@anu.edu.au
AJA International Sputter
Inside chamber
Plasma during deposition